课程为微纳电子学系本科生三年级及以上开设，是半导体器件与制造工艺方向的专业选修课。通过本课程的学习和实验，使学生得以借助 TCAD 器件和工艺模拟仿真软件掌握半导体器件的建模、仿真和对集成电路工艺制造过程进行模拟，以及通过实际操作掌握集成电路制造的基本工艺步骤和工艺操作。本课程为学生深入理解半导体器件以及集成电路制造工艺，实践基础的集成电路制造工艺操作提供了一种生动、直观而且重要的手段，是学习和了解当今集成电路制造和微加工技术的重要基础课程。

本课程主要实践两方面的内容：（1）学习使用 Silvaco  Athena工艺仿真软件来模拟集成电路制造过程中的各工艺步骤，并通过Atlas器件仿真软件对工艺模拟的结果进行验证；（2）学习实践集成电路制造的基本工艺步骤和工艺操作，包括：湿法清洗、氧化、光刻、金属蒸镀、湿法刻蚀、离子束干法刻蚀等。此外，课程还将通过FDSOI器件虚拟仿真实验了解EUV光刻机工作原理并在虚拟工厂综合复习所学各种工艺步骤，来提升对本专业的兴趣和热情。

The course is for the undergraduate students of 3rd year and above with major/minor in Micro/Nano-Electronics. It is one of the electives for students with specialty in the semiconductor devices and IC fabrication area. The objective of this course is for the students to simulate the device performance and the IC fabrication process by using TCAD software suite and to get hands-on experience on the basic operations and skills to fabricate a semiconductor device. This course also provides the students a vivid, intuitive, yet important means to get a better understanding of semiconductor device and IC fabrication and to practice the basic IC fabrication operations and skills. It is an important course to understand the state-of-art IC fabrication and micro/nano-fabrication technologies.
This course mainly practices two parts, the first is to learn the use of Silvaco TCAD tool to simulate the manufacturing of devices by individual manufacturing steps and the performance of devices obtained; the second part is to practice basic IC fabrication operations, including RCA cleaning, oxidation, photolithography, wet etching, sputtering, and etc. A virtual simulation of FDSOI device fabrication is also performed to assist the understanding of the working principle of EUV lithography machine and the review of various processing steps in a virtual fab environment, so as to enhance the interest and enthusiasm for the students.